Speakers
25
11 2021
Webinars
Investment trends and guidelines for Korean Investor in Hi-tech Industry
02:00 PM - 04:00 PM, Thursday 25th of November 2021
Content
Investment trends and guidelines for Korean Investor in Hi-tech Industry
Vietnam has attracted many foreign hi-tech industries with its preferential policies for hi-tech. As Samsung entered Saigon Hi-Tech Park in Ho Chi Minh City; in October of last year, LG Electronics opened the "Electronics Development Center" in Da Nang City, Relevant vendors are advancing together, and interest is also focused on hi-tech industry-related benefits and hi-tech factory rentals.
Long Hau Industrial Park, Da Nang Investment Promotion Agency, and Da Nang Hi-Tech Park and Industrial Zones Authority are co-hosting in webinar “Investment Trends and guidelines for Korean Investor in Hi-tech Industry”. The webinar will provide the latest updates on the investment environment in Da Nang - a representative city in central Vietnam and highlight investment incentives. In particular, Danang IPA will present an issue Korean investors concerned about the supply chains and human resources.
Highlights Webinar:
- Investment situation of Korean investors in Vietnam and Forecast Post-Corona FDI Investment Attraction Trend
- Seeking to develop the supply chains and prepare the human resources for hi-tech industry in Danang
- Is it possibile for Da Nang to become the "Silicon valley" of Vietnam?
- Korean Investor's Journey: Set up a successful Hi -tech factory in Vietnam
Event info:
- Time: 2:00PM - 04:00PM, November 25, 2021 (Vietnam time zone)
- Online platform: Zoom
Link register:
Speaker:
- Mr Pham Viet Tuan – First Secretary , The Embassy of Social Republic of Vietnam in S.Korea, Incharge of Investment
- Ms Huynh Lien Phuong, Director of Da Nang Investment Promotion Agency (IPA Da Nang)
- Ms Park Su Won, Toan Huy Hoang Realty (Korea Desk)
- Ms Tran Phuong Anh, Investment Consultant (Korea Desk) Long Hau IP
Moderator:
- Ms Tran Phuong Anh, Investment Consultant (Korea Desk) Long Hau IP
Adenda: